𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Kinetic Study of the Emission of the First Negative System in an Argon-Nitrogen Plasma at Atmospheric Pressure

✍ Scribed by G. Callède; J. Deschamps; J. L. Godart

Publisher
John Wiley and Sons
Year
1993
Tongue
English
Weight
433 KB
Volume
33
Category
Article
ISSN
0005-8025

No coin nor oath required. For personal study only.

✦ Synopsis

Abstract

Quantitative optical spectroscopy measurements of the emission spectra of the N(B^2^∑~u~,)ν′→X^2^∑~g~ν″ transition (first negative system) in an Ar‐N~2~ microwave discharge at atmospheric pressure have allowed determination of the rate coefficient of the production of N molecules in the B^2^ ∑~u~, state with vibrational level ν′ = 0.

The N(B^2^∑~u~, ν′) molecules are produced by the reactionmagnified imagein a surface‐wave‐induced microwave discharge (2450 MHz) sustained in an open‐ended dielectric tube. The rate coefficient K (T) has been obtained for ν′ν″ = 0 for different gas temperatures by varying the incident microwave power. The K~00~(T) values are between 7.10^−10^ and 4.10^−10^ cm^3^ s^−1^ for the temperature range 2500 to 3450K.

📜 SIMILAR VOLUMES

An atmospheric pressure chemical ionizat
An atmospheric pressure chemical ionization study of the positive and negative ion chemistry of the hydrofluorocarbons 1,1-difluoroethane (HFC-152a) and 1,1,1,2-tetrafluoroethane (HFC-134a) and of perfluoro-n-hexane (FC-72) in air plasma at atmospheric pressure
✍ Ester Marotta; Cristina Paradisi; Gianfranco Scorrano 📂 Article 📅 2004 🏛 John Wiley and Sons 🌐 English ⚖ 216 KB

## Abstract A report is given on the ionization/dissociation behavior of the title compounds within air plasmas produced by electrical corona discharges at atmospheric pressure: both positive and negative ions were investigated at different temperatures using atmospheric pressure chemical ionizatio

Atomic force microscopy and high-resolut
Atomic force microscopy and high-resolution RBS investigation of the surface modification of magnetron sputter-etched Si(111) in an argon plasma at different pressures
✍ Deenapanray, P. N. K.; Hillie, K. T.; Demanet, C. M.; Ridgway, M. C. 📂 Article 📅 1999 🏛 John Wiley and Sons 🌐 English ⚖ 353 KB 👁 2 views

The surface morphology and metallic contamination of magnetron sputter-etched Si(111) was investigated by atomic force microscopy (AFM) and high-resolution Rutherford backscattering spectroscopy (RBS) as a function of Ar plasma pressure. The root-mean-square roughness (R rms ) of plasma-etched Si de

An accurate single-sinker densimeter and
An accurate single-sinker densimeter and measurements of the (p, ρ,T) relation of argon and nitrogen in the temperature range from (235 to 520) K at pressures up to 30 MPa
✍ J. Klimeck; R. Kleinrahm; W. Wagner 📂 Article 📅 1998 🏛 Elsevier Science 🌐 English ⚖ 497 KB

A single-sinker densimeter has been developed for accurate density measurements in the Ž . Ž technically and scientifically important regions of the p, , T surface of fluids density range . y3 . y3 2 kg m to 2000 kg m ; temperature range 233 K to 523 K; pressure range 0.2 MPa to . 30 MPa . The meth