IR transmittance studies of hydrogen-free and hydrogenated silicon nitride and silicon oxynitride films deposited by reactive sputtering: Dirk Schalch et al, Thin Solid Films, 155, 1987, 301–308

• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 157 KB
• Volume: 39
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(89)90315-1