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IR study of fundamental chemical reactions in atomic layer deposition of HfO2 with tetrakis(ethylmethylamino)hafnium (TEMAH), ozone, and water vapor

✍ Scribed by F. Hirose; Y. Kinoshita; K. Kanomata; K. Momiyama; S. Kubota; K. Hirahara; Y. Kimura; M. Niwano


Book ID
116245290
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
716 KB
Volume
258
Category
Article
ISSN
0169-4332

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