Ion range and damage depth parameters for 20–200 keV Pb+ ion implantation in Si

✍ Scribed by C.E. Christodoulides; N.J. Kadhim; G. Carter; J.J. Jimenez-Rodriguez; A. Gras-Marti

• Publisher: Elsevier Science
• Year: 1981
• Weight: 779 KB
• Volume: 191
• Category: Article
• ISSN: 0167-5087
• DOI: 10.1016/0029-554x(81)90994-0