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Ion implantation of Ti into Al into Ti in the presence of residual and backfilled gases

✍ Scribed by B. Hoffmann; H. Baumann; F. Rauch; K. Bethge


Book ID
113280019
Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
646 KB
Volume
36
Category
Article
ISSN
0168-583X

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