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Ion implantation-induced damage depth profile determination in SiC by means of RBS/C and bevelling technique

✍ Scribed by J. Romanek; D. Grambole; F. Herrmann; M. Voelskow; M. Posselt; W. Skorupa; J. Żuk


Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
326 KB
Volume
251
Category
Article
ISSN
0168-583X

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