Ion implantation in wafer fabrication: Pieter S. Burggraai Semicond. Int. 39 (Nov 1981)
- Book ID
- 104157212
- Publisher
- Elsevier Science
- Year
- 1984
- Tongue
- English
- Weight
- 93 KB
- Volume
- 15
- Category
- Article
- ISSN
- 0026-2692
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✦ Synopsis
CHMT-4 (4), 361 (1981)
A process using laser-machining techniques has been developed for patterning the detailed features of thin film Ta2N resistors on as-fired ceramic substrates. Laser machining serpentine patterns in etched blocks of resistor films reduces line and space widths below those practical with off-contact photolithography and wet etching. The resulting area savings varies as a function of resistance from a factor of 1.5 to about five. The laserpatterned resistor is designed to retain the high stability of conventionally patterned resistors and to allow its incorporation into thin film resistor-capacitor (RC) circuits. Compatibility with standard RC processing has been established. The results of thermal-aging studies have been extrapolated to predict a resistance drift of less than 0.1 percent over 20 years at 65~
Recent trends in ion implantation WESLEY H. WEISENBERGER Solid-State Technol. 118 (Nov 1981) There have been many advances in ion implantation since it was conceived as a doping technique for semiconductors. This paper describes general trends in implant technology and deals with some of the most often asked questions regarding control of implant uniformity.