Ion Chemistry in XH4/Allene (X = Ge, Si) Gaseous Mixtures – Formation of X–C Bonds

✍ Scribed by Paola Benzi; Lorenza Operti; Roberto Rabezzana

• Publisher: John Wiley and Sons
• Year: 2000
• Tongue: English
• Weight: 287 KB
• Volume: 2000
• Category: Article
• ISSN: 1434-1948
• DOI: 10.1002/(sici)1099-0682(200003)2000:3<505::aid-ejic505>3.0.co;2-i

✦ Synopsis

The gas-phase ion chemistry of germane/allene and silane/ allene mixtures has been studied, with the aim of obtaining information on the experimental conditions leading to the formation of clusters of increasing size containing Ge or Si bonded to carbon atoms. Mechanisms of ion/molecule reactions have been elucidated by ion-trap mass spectrometry using single and multiple isolation steps. Rate constants for the most important reactions have been determined experimentally and compared with collisional rate constants. The germane/allene mixtures display a low reactivity and the most abundant germanium and carbon containing ion is GeCH 3 + .