Production of Thin Epitaxial Films Using
β
Gorris, F. ;Krug, C. ;Kubsky, S. ;Baumvol, I. J. R. ;Schulte, W. H. ;Rolfs, C.
π
Article
π
1999
π
John Wiley and Sons
π
English
β 188 KB
π 2 views
An ion beam deposition system to produce isotopically pure epitaxial thin films of different materials has been designed and built. Using negative ions, problems due to mass interference with molecular ions could be significantly reduced, thus allowing the production, for instance, of 29 Si films of