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Ion-assisted sputter deposition

✍ Scribed by Colligon, J. S.

Book ID
127236923
Publisher
The Royal Society
Year
2003
Tongue
English
Weight
378 KB
Volume
362
Category
Article
ISSN
0264-3952

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πŸ“œ SIMILAR VOLUMES

Ion-assisted deposition in unbalanced-ma
Ion-assisted deposition in unbalanced-magnetron sputtering systems
✍ William D. Sproul πŸ“‚ Article πŸ“… 1993 πŸ› Elsevier Science 🌐 English βš– 645 KB

In conventional balanced-magnetron (CBM) sputtering, the amount of ion bombardment of the growing film, as measured by the substrate bias current density, is limited to less than 1 mA cm -z. Fast secondary electrons escaping from the target surface quickly find a path to ground and undergo few ioniz