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Investigations on the correlation between growth rate and gate oxide integrity of Czochralski-grown silicon

✍ Scribed by D. Zemke; P. Gerlach; W. Zulehner; K. Jacobs

Publisher: Elsevier Science
Year: 1994
Tongue: English
Weight: 993 KB
Volume: 139
Category: Article
ISSN: 0022-0248
DOI: 10.1016/0022-0248(94)90026-4

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