✦ LIBER ✦

Investigations of TiO2 films deposited by different techniques

✍ Scribed by K. Bange; C.R. Ottermann; O. Anderson; U. Jeschkowski; M. Laube; R. Feile

Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 453 KB
Volume: 197
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(91)90238-s

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Photoelectrochemical properties of plasm

Photoelectrochemical properties of plasma-deposited TiO2 thin films

✍ L.M. Williams; D.W. Hess 📂 Article 📅 1984 🏛 Elsevier Science 🌐 English ⚖ 370 KB

Low temperature SiO2 films deposited by

Low temperature SiO2 films deposited by plasma enhanced techniques

✍ JC Alonso; A Ortiz; C Falcony 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 506 KB

Heteroepitaxial growth of TiO2 films by

Heteroepitaxial growth of TiO2 films by ion-beam sputter deposition

✍ P.A.Morris Hotsenpiller; G.A. Wilson; A. Roshko; J.B. Rothman; G.S. Rohrer 📂 Article 📅 1996 🏛 Elsevier Science 🌐 English ⚖ 500 KB

Deposition of TiO2 thin films by plasma-

Deposition of TiO2 thin films by plasma-enhanced decomposition of tetraisopropyltitanate

✍ H.J. Frenck; W. Kulisch; M. Kuhr; R. Kassing 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 435 KB

Synthesis of anatase TiO2 film by reacti

Synthesis of anatase TiO2 film by reactive vacuum arc deposition method

✍ Hirofumi Takikawa; Tsuyoshi Sasaoka; Tateki Sakakibara 📂 Article 📅 1999 🏛 John Wiley and Sons 🌐 English ⚖ 484 KB

TiO 2 in anatase crystalline structure has strong photocatalysis. In this paper, TiO 2 films are deposited on sodaglass substrate using a Ti cathode vacuum arc with O 2 flow. Experimental conditions are as follows: arc current, 50 A; pressure, 0.3 and 1.0 Pa; O 2 flow rate, 20 ml/min; cathode substr

Chemical vapor deposition of doped TiO2

Chemical vapor deposition of doped TiO2 thin films

✍ Sarah R. Kurtz; Roy G. Gordon 📂 Article 📅 1987 🏛 Elsevier Science 🌐 English ⚖ 556 KB