Optical Characterization of Silicon Oxyn
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Yi-Ming Xiong; Paul G. Snyder; John A. Woollam; G. A. Al-Jumaily; F. J. Gagliard
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Article
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1992
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John Wiley and Sons
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English
β 424 KB
## Abstract Silicon oxynitride (SiO~x~ N~y~) thin films were deposited on silicon substrates by ionβassisted deposition. Variable angle spectroscopic ellipsometry (VASE) was used to optically characterize the deposited film properties, such as layer thickness and composition, film surface and inter