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Investigation using transmission electron microscopy of the microstructure of TiN film formed by ion beam enhanced deposition under 90 keV Xe+ bombardment on an Si substrate

✍ Scribed by Z.Y. Ching; Jing Zhu; X.H. Liu; Xi Wang; G.Q. Yang


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
260 KB
Volume
66
Category
Article
ISSN
0257-8972

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