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Investigation on interface of NiFeCr/NiFe/Ta films with high magnetic field sensitivity

✍ Scribed by Shu Sheng; Wei Li; Minghua Li; Guanghua Yu

Book ID
113107579
Publisher
Nonferrous Metals Society of China
Year
2012
Tongue
English
Weight
363 KB
Volume
31
Category
Article
ISSN
1001-0521

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The sputtering target for high-resistance thin film resistors plays a decisive role in temperature coefficient of resistance (TCR). Silicon-rich chromium (Cr)-silicon (Si) target was designed and smelted for high-resistance thin film resistors with low TCR. Valve metal tantalum (Ta) and aluminum (Al