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Investigation of the properties of superconducting niobium nitride films

โœ Scribed by V.M. Pan; V.P. Gorishnyak; E.M. Rudenko; V.E. Shaternik; M.V. Belous; S.A. Koziychuk; F.I. Korzhinsky


Publisher
Elsevier Science
Year
1983
Tongue
English
Weight
408 KB
Volume
23
Category
Article
ISSN
0011-2275

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Deposition of Niobium Nitride Thin Films
โœ Tobias B. Thiede; Harish Parala; Knud Reuter; Gerd Passing; Stephan Kirchmeyer; ๐Ÿ“‚ Article ๐Ÿ“… 2009 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 426 KB ๐Ÿ‘ 1 views

Niobium nitride thin films are deposited on 2 00 silicon (100) wafers using a modified industrial metal-organic (MO) CVD reactor of the type AIX-200RF, starting from tert-butylamido-tris-(diethylamido)-niobium (TBTDEN) and ammonia. Films of thicknesses 50-200 nm are deposited at temperatures ranging