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Investigation of the physical and chemical interaction of a low energy oxygen ion beam with oxide superconducting films

✍ Scribed by G. Pindoria; M. Badaye; F. Wang; K. Kawaguchi; T. Morishita

Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
452 KB
Volume
100-101
Category
Article
ISSN
0169-4332

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Oxygen ions with energy in the range 4-15 keV O' were used to synthesize surface oxide layers by bombarding Si samples at di †erent angles of incidence with respect to the surface normal. High-resolution Rutherford backscattering spectroscopy and channelling were used to determine both the stoichiom