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Investigation of the influence of the microstructure on the scattering properties of a complex rough surface

✍ Scribed by O. K. Taganov; V. A. Taganova

Publisher
Springer US
Year
1979
Tongue
English
Weight
400 KB
Volume
31
Category
Article
ISSN
0021-9037

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The surface roughness of the semiconductor substrate substantially influences properties of the whole semiconductor/oxide structure. SiO 2 /Si structures were prepared by using low temperature nitric acid oxidation of silicon (NAOS) method and then the whole structure was passivated by the cyanidiza