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Investigation of the curing behavior of a novel epoxy photo-dielectric dry film (ViaLux™ 81) for high density interconnect applications

✍ Scribed by Rajiv C. Dunne; Suresh K. Sitaraman; Shijian Luo; Yang Rao; C. P. Wong; William E. Estes; Ceferino G. Gonzalez; John C. Coburn; Mookan Periyasamy


Publisher
John Wiley and Sons
Year
2000
Tongue
English
Weight
248 KB
Volume
78
Category
Article
ISSN
0021-8995

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