Investigation of the atomic interdiffusion and phase formation in ion beam-irradiated thin Cu-Al and Ag-Al multilayers byin situ RBS and XRD
✍ Scribed by Markwitz, A.; Matz, W.; Waldschmidt, M.; Demortier, G.
- Publisher
- John Wiley and Sons
- Year
- 1998
- Tongue
- English
- Weight
- 953 KB
- Volume
- 26
- Category
- Article
- ISSN
- 0142-2421
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✦ Synopsis
Ion beam-induced interdi †usion and phase formation processes in thin Cu-Al and Ag-Al multilayers were investigated with in situ RBS and X-ray di †raction (XRD), respectively. The metal layers were deposited by evaporation on polished glassy carbon and single-crystal silicon substrates. In order to initiate interdi †usion, the specimens were bombarded with high-current 2.0 MeV 4He' ion beams. Depending on the metal layer system, di †erent interdiffusion and phase formation behaviour were observed (phases formed after irradiation : and Al 2
Cu, Al 4 Cu 9 Ag 2 Al). Fast interdi †usion was measured for the Ag-Al and Cu-Al systems deposited on glassy carbon, whereas much lower interdi †usion was observed for the same multilayered systems deposited on S100T Si, even though the multilayers of each system were deposited at the same time. In addition, the interdi †usion was signiÐcantly slower in Cu-Al multilayers than in Ag-Al multilayers.