Investigation of simultaneous fluorine and carbon incorporation in a silicon oxide dielectric layer grown by PECVD

✍ Scribed by S. Altshuler; Y. Chakk; A. Rozenblat; A. Cohen

• Publisher: Elsevier Science
• Year: 2005
• Tongue: English
• Weight: 208 KB
• Volume: 80
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2005.04.024