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Investigation of mask pattern proximity correction to reduce image shortening in X-ray lithography

✍ Scribed by Scott Hector; Victor Pol; Mumit Khan; Srinivas Bollepalli; Franco Cerrina

Book ID: 114155787
Publisher: Elsevier Science
Year: 1998
Tongue: English
Weight: 348 KB
Volume: 41-42
Category: Article
ISSN: 0167-9317
DOI: 10.1016/s0167-9317(98)00062-8

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