✦ LIBER ✦
Investigation of high-K gate stacks with epitaxial Gd2O3 and FUSI NiSi metal gates down to CET=0.86 nm
✍ Scribed by H.D.B. Gottlob; T. Echtermeyer; T. Mollenhauer; J.K. Efavi; M. Schmidt; T. Wahlbrink; M.C. Lemme; H. Kurz
- Publisher
- Elsevier Science
- Year
- 2006
- Tongue
- English
- Weight
- 235 KB
- Volume
- 9
- Category
- Article
- ISSN
- 1369-8001
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