✦ LIBER ✦

Inverse design for phase mask lithography: erratum

✍ Scribed by Rinne, James W.; Gupta, Sidhartha; Wiltzius, Pierre

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Inverse design for phase mask lithograph

✍ Rinne, James W.; Gupta, Sidhartha; Wiltzius, Pierre 📂 Article 📅 2008 🏛 Optical Society of America 🌐 English ⚖ 696 KB

Generalized inverse lithography methods

✍ Ma, Xu; Arce, Gonzalo R. 📂 Article 📅 2007 🏛 Optical Society of America 🌐 English ⚖ 217 KB

Initialization for robust inverse synthe

✍ Chan, Stanley H.; Wong, Alfred K.; Lam, Edmund Y. 📂 Article 📅 2008 🏛 Optical Society of America 🌐 English ⚖ 871 KB

Binary mask optimization for inverse lit

✍ Ma, Xu; Arce, Gonzalo 📂 Article 📅 2008 🏛 Optical Society of America 🌐 English ⚖ 821 KB

Attenuated phase-shift mask for line pat

✍ Minoru Sugawara; Akira Chiba; Hiromasa Yamanashi; Hiroaki Oizumi; Iwao Nishiyama 📂 Article 📅 2003 🏛 Elsevier Science 🌐 English ⚖ 277 KB

PSM design for inverse lithography with

✍ Ma, Xu; Arce, Gonzalo R. 📂 Article 📅 2008 🏛 Optical Society of America 🌐 English ⚖ 691 KB