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Intrinsic stress, island coalescence, and surface roughness during the growth of polycrystalline films

✍ Scribed by Sheldon, Brian W.; Lau, K. H. A.; Rajamani, Ashok


Book ID
121732719
Publisher
American Institute of Physics
Year
2001
Tongue
English
Weight
324 KB
Volume
90
Category
Article
ISSN
0021-8979

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Tensile stresses that arise during the growth of polycrystalline films are described using a cohesive zone approach, along with a finite element model that accounts for different dihedral angles at grain boundary intersections with the growth surface. This combined approach predicts the maximum tens