Intrinsic crystalline-to-amorphous transition above 400 °C in plasma-deposited Si thin films

✍ Scribed by Kamei, Toshihiro

• Book ID: 121343747
• Publisher: American Institute of Physics
• Year: 2006
• Tongue: English
• Weight: 325 KB
• Volume: 89
• Category: Article
• ISSN: 0003-6951
• DOI: 10.1063/1.2426905