Interrelation between the Parameters of Chemical Vapor Deposition, Properties, and Structure of Borophosphosilicate Glass Films Used in the Silicon Integrated Circuit Technology

✍ Scribed by V. Yu. Vasilev

• Book ID: 111560416
• Publisher: SP MAIK Nauka/Interperiodica
• Year: 2003
• Tongue: English
• Weight: 70 KB
• Volume: 29
• Category: Article
• ISSN: 1087-6596
• DOI: 10.1023/a:1026386929586