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International Workshop on Nonlinear Processes in Materials Design: Critical Issues and Future Directions

โœ Scribed by Yu. D. Tret'yakov; B. R. Churagulov


Book ID
110392545
Publisher
SP MAIK Nauka/Interperiodica
Year
2002
Tongue
English
Weight
18 KB
Volume
38
Category
Article
ISSN
0020-1685

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Thin-ยฎlm device processing relies heavily on the integration of a variety of materials and a wide array of process steps. These include in some instances, the integration of `wet' (chemical etching) and `dry' (deposition and plasma etching) process steps. As substrates are stepped through the proces