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Internal stress in thin films prepared by ion beam and vapor deposition

โœ Scribed by Naoto Kuratani; Osamu Imai; Akinori Ebe; Satoshi Nishiyama; Kiyoshi Ogata

Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
282 KB
Volume
66
Category
Article
ISSN
0257-8972

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Y 2 O 3 thin films were deposited by ion beam assisted deposition (IBAD) and the effects of fabrication parameters such as substrate temperature and ion energy on the structure, optical and electrical properties of the films were investigated. The results show that the deposited Y 2 O 3 films had le