Interfacial reaction of nickel/hydrogenated amorphous silicon system at low temperature studied by fluorescence exafs

✍ Scribed by Yunosuke Kawadzu; Mitsuru Iloka; Americo Fujii; Hiroyuki Oyanagi; Toshihiro Arai

• Book ID: 103615144
• Publisher: Elsevier Science
• Year: 1990
• Tongue: English
• Weight: 436 KB
• Volume: 41-42
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/0169-4332(89)90074-3