Interface Stability and Silicide Formation in High Temperature Stable MoxSi1−x/Si Multilayer Soft X-Ray Mirrors Studied by Means of X-Ray Diffraction and HRTEM

✍ Scribed by Kleineberg, U. ;Stock, H.-J. ;Kloidt, A. ;Schmiedeskamp, B. ;Heinzmann, U. ;Hopfe, S. ;Scholz, R.

• Publisher: John Wiley and Sons
• Year: 1994
• Tongue: English
• Weight: 837 KB
• Volume: 145
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/pssa.2211450238