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Interface diffusion characteristics of Al–2 at.%Nd/n + a-Si:H and Al–2 at.%Nd/n + poly-Si bilayers

✍ Scribed by Nackbong Choi; Soo-Young Yoon; Chang-Dong Kim; Miltiadis Hatalis

No coin nor oath required. For personal study only.

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Interface diffusion characteristics of Al–2&#xa0;at.%Nd/n&#xa0;+&#xa0;a-Si:H and Al–2&#xa0;at.%Nd/n&#xa0;+&#xa0;poly-Si bilayers