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Intense visible photoluminescence in amorphous SiOx and SiOx:H films prepared by evaporation

โœ Scribed by Rinnert, H.; Vergnat, M.; Marchal, G.; Burneau, A.


Book ID
119939429
Publisher
American Institute of Physics
Year
1998
Tongue
English
Weight
368 KB
Volume
72
Category
Article
ISSN
0003-6951

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A simple reactive evaporation method is proposed to prepare light-emitting SiO x thin films. Pure silicon is evaporated in a controlled molecular oxygen atmosphere. By changing the pressure in the preparation chamber, x can be varied from 0.7 to 1.85. The samples were annealed in the range 350-1100