Integration of a TiN barrier layer formed by rapid thermal annealing in a 1 μm CMOS process

✍ Scribed by K.-H. Stegemann; V. Heinig; G. Fontaine; J. Palorec; C. Beyer

• Publisher: Elsevier Science
• Year: 1995
• Tongue: English
• Weight: 677 KB
• Volume: 91
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/0169-4332(95)00136-0