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Integration Benefits of Carborane Molecular Implant for State-of-the-Art 28-nm Logic pFET Device Manufacturing

✍ Scribed by Li, C. I.; Shen, T. M.; Kuo, P.; Liu, R.; Chan, M.; Yang, C. L.; Wu, J. Y.; Colombeau, B.; Guo, B. N.; Thanigaivelan, T.; Toh, T.; Sun, H. L.; Wu, T.; Lu, S.


Book ID
120354257
Publisher
IEEE
Year
2011
Tongue
English
Weight
472 KB
Volume
32
Category
Article
ISSN
0741-3106

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