Integrated plasma processing simulation framework, linking tool scale plasma models with 2D feature scale etch simulator

✍ Scribed by M. Hauguth; B.E. Volland; V. Ishchuk; D. Dressler; T. Danz; I.W. Rangelow; G. Kokkoris; E. Gogolides; A. Goodyear; M. Cooke

• Publisher: Elsevier Science
• Year: 2009
• Tongue: English
• Weight: 291 KB
• Volume: 86
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2009.02.012