Instability of SiF bonds in fluorinated silicon oxide (SiOF) films formed by various techniques

✍ Scribed by Tetsuya Homma

• Book ID: 103425908
• Publisher: Elsevier Science
• Year: 1996
• Tongue: English
• Weight: 488 KB
• Volume: 278
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(95)08116-x