INSAP: In Situ Surface Adduct Passivation as a New Route to the Protection and Functionalization of III–V Surfaces Following MOCVD Growth

✍ Scribed by Martyn E. Pemble; Heather M. Yates; Rebecca F. Yates

• Publisher: John Wiley and Sons
• Year: 1998
• Tongue: English
• Weight: 150 KB
• Volume: 04
• Category: Article
• ISSN: 0948-1907
• DOI: 10.1002/(sici)1521-3862(199810)04:05<190::aid-cvde190>3.0.co;2-u