Initial silicide formation process of Mo/(100) Si system prepared using an ultrahigh-vacuum sputtering system

✍ Scribed by Naoya Ohishi; Hideto Yanagisawa; Katsutaka Sasaki; Yoshio Abe

• Publisher: John Wiley and Sons
• Year: 2001
• Tongue: English
• Weight: 136 KB
• Volume: 84
• Category: Article
• ISSN: 8756-663X
• DOI: 10.1002/1520-6432(200103)84:3<71::aid-ecjb8>3.0.co;2-o