Infrared study of the sorption of HSiCl3 on silica and the stability of the chemisorbed layers
โ Scribed by M.J.D Low; A.G Severdia; J Chan
- Publisher
- Elsevier Science
- Year
- 1982
- Tongue
- English
- Weight
- 577 KB
- Volume
- 86
- Category
- Article
- ISSN
- 0021-9797
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๐ SIMILAR VOLUMES
Infrared spectra are reported for silica in two states of surface hydroxylation immersed in carbon tetrachloride containing in particular ( \(\mathrm{MeO})_{3} \mathrm{SiCH}_{2} \mathrm{CH}_{2} \mathrm{CH}_{2} \mathrm{NH}_{2}\). Adsorption involved hydrogen bonding between silanol and \(\mathrm{OMe}
The adsorption and dissociation of \(\mathrm{CH}_{3} \mathrm{Cl}\) and \(\mathrm{CH}_{3} \mathrm{I}\) have been investigated by means of infrared spectroscopy at 193-573 K. Both compounds adsorb molecularly on \(\mathrm{Pd} / \mathrm{SiO}_{2}\) at \(193 \mathrm{~K}\) and interact strongly with the \