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Infrared study of some reactions with reactive sites on dehydroxylated silica

โœ Scribed by Morrow, B. A.; Cody, I. A.


Book ID
118749520
Publisher
American Chemical Society
Year
1975
Tongue
English
Weight
228 KB
Volume
79
Category
Article
ISSN
0022-3654

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A thin film infrared technique is used to observe bands due to hydrogen-bonded and chemisorbed methoxymethylsilanes on fumed silica in the low-frequency region below 1300 cm(-1). The low-frequency region contains the characteristic bands due to Si-O-Si, Si-O, Si-C, Si-CH(3), and SiO-C modes. Band as