## Ε½ . Ε½ . The chemical compositions of physical vapor-deposited PVD and chemical vapor-deposited CVD titanium nitride Ε½ . Ε½ . TiN thin films were investigated by X-ray photoelectron spectroscopy XPS . The effect of a H rN plasma treatment on 2 2 the chemical composition of CVD TiN thin film was a
β¦ LIBER β¦
Infrared and photoelectron spectroscopy study of vapor phase deposited poly (3-hexylthiophene)
β Scribed by Haoyan Wei; L. Scudiero; Hergen Eilers
- Book ID
- 103819913
- Publisher
- Elsevier Science
- Year
- 2009
- Tongue
- English
- Weight
- 347 KB
- Volume
- 255
- Category
- Article
- ISSN
- 0169-4332
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