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Influences of the inclination of gratings on the alignment accuracies in moiré alignment systems

✍ Scribed by Hideo Furuhashi; Lizhong Zhou; Jingnan Liu; Akihito Matsuo; Yoshiyuki Uchida

Publisher
John Wiley and Sons
Year
2002
Tongue
English
Weight
201 KB
Volume
139
Category
Article
ISSN
0424-7760

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✦ Synopsis

Abstract

In the lithographic processes of VLSIs, high setting accuracies between masks and wafer are required. The methods using moiré signals obtained by gratings were found to give very high alignment accuracies. In this paper, influences of the inclination of gratings for the alignment accuracies in modified and differential moiré systems have been investigated. The moiré signals and the alignment point have been calculated using computer simulation. As a result, it has been shown that the effects are small and the inclinations do not affect alignment accuracies in the moiré alignment systems. © 2002 Scripta Technica, Electr Eng Jpn, 139(2): 46–51, 2002; DOI 10.1002/eej.1152

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