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Influence of the substrate voltage on the random telegraph signal parameters in submicron n-channel metal-oxide-semiconductor field-effect transistors under a constant inversion charge density

✍ Scribed by S. Khalfallah; C. Gorecki; J. Podlecki; M. Nishioka; H. Kawakatsu; Y. Arakawa


Publisher
Springer
Year
2000
Tongue
English
Weight
75 KB
Volume
70
Category
Article
ISSN
1432-0630

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