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Influence of the residual gases nitrogen, oxygen, and argon on the electrical properties of Cu-films, vapour deposited in high vacuum: W Juchem and U D Strahle, Vakuum-Technik, 20 (4), May 1971, 110–117 (in German).


Publisher
Elsevier Science
Year
1971
Tongue
English
Weight
153 KB
Volume
21
Category
Article
ISSN
0042-207X

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