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Influence of the PVD sputtering method on structural characteristics of SiCN-coatings — Comparison of RF, DC and HiPIMS sputtering and target configurations

✍ Scribed by Casper Pusch; Holger Hoche; Christina Berger; Ralf Riedel; Emanuel Ionescu; Andreas Klein

Book ID
113919511
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
531 KB
Volume
205
Category
Article
ISSN
0257-8972

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## Abstract Indium–tin‐oxide (ITO) deposited by conventional capacitive RF magnetron sputtering (rf MS), DC facing target sputtering (dc FTS) and two postannealed samples of these were compared. Comparison of the ITOs aimed at investigating the surface and microstructure effect on the electrical an