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Influence of the oxygen incorporation on the stability of Al/TiN/Si structures

✍ Scribed by C. Jiménez; M. Fernández; J.M. Albella; J.M. Martínez-Duart


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
300 KB
Volume
70-71
Category
Article
ISSN
0169-4332

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On the ion irradiation stability of Al/T
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A comparative study of the structural changes induced in Al/Ti and AlN/TiN multilayers by argon ion irradiation is presented. The layers were deposited on Si substrates, by ion sputtering in case of pure metals, and reactive ion sputtering in case of metal-nitrides, to a total thickness of $270 nm.