✦ LIBER ✦
Influence of the initial boron doping level on the boron atom distribution arising as a result of heat treatment in silicon implanted with boron ions
✍ Scribed by V. I. Obodnikov; E. G. Tishkovskii
- Book ID
- 110119776
- Publisher
- Springer
- Year
- 1998
- Tongue
- English
- Weight
- 69 KB
- Volume
- 32
- Category
- Article
- ISSN
- 1063-7826
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