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Influence of the As:Ga flux ratio on growth rate, interface quality, and impurity incorporation in AlGaAs/GaAs quantum wells grown by molecular beam epitaxy

✍ Scribed by Köhrbrück, R.; Munnix, S.; Bimberg, D.; Larkins, E. C.; Harris, J. S.


Book ID
121686446
Publisher
American Institute of Physics
Year
1989
Tongue
English
Weight
576 KB
Volume
54
Category
Article
ISSN
0003-6951

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