Influence of tantalum dopant ions (Ta5+) on the efficiency of the tungsten trioxide photoelectrode

✍ Scribed by Enesca, A. ;Duta, A. ;Schoonman, J.

• Publisher: John Wiley and Sons
• Year: 2008
• Tongue: English
• Weight: 392 KB
• Volume: 205
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/pssa.200778858

✦ Synopsis

Abstract

The paper presents the influence of the tantalum dopant ions (Ta^5+^) on the properties of WO~3~ film, used as photoelectrode for water photolysis. The photoluminescence and photocurrent stability were recorded in a photoelectrochemical system having doped and, respectively, undoped WO~3~ films, deposited by spray pyrolysis on fluorine–doped tin oxide as photoanode and Pt as cathode, in electrolyte HCl (pH = 5). The crystalline structure, topography and electrical properties were investigated. The experiments confirm that the doping process double the photoelectrode efficiency. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)